Hydrogen adsorption on Dy and Tm films |
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| Authors: | K. N. Zhavoronkova and O. E. Boeva |
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| Affiliation: | (1) Mendeleev Institute of Chemical Technology, 125047 Moscow, USSR |
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| Abstract: | Variations in resistivity R and work function  of thin Tm and Dy films due to H2 adsorption on their surface at 77 K have been studied. It is suggested that on most surfaces hydrogen is strongly adsorbed as H– , and only below 10% monolayer is its weakly adsorbed form H2+. The observed decrease of is attributed to H– penetrating into lattice vacancies and surface cavities.
                R     Tm Dy,  H2 77 K.  ,      H–°, 10%  H2+.     H–  .
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