Fabrication challenges for patterned recording media

Lithographically patterned recording media are one of the approaches to achieving Tb/in² and beyond recording densities. This will require fabrication of sub-10 nm discrete magnetic islands covering a full disk with tight spacing and size distributions and a narrow switching field distribution. To become an economically successful technology, this will need to be achieved with high throughput and low cost. The technology to fabricate such patterned media will need to be developed, and may require innovative solutions such as self-assembly and nanoimprinting, along with improved magnetic thin films for achieving high anisotropy and narrow switching field distributions.