Averaging scheme for atomic resolution off-axis electron holograms |
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| Affiliation: | 1. University Service Centre for Transmission Electron Microscopy, Vienna University of Technology, Wiedner Hauptstrasse 8-10, A-1040 Wien, Austria;2. Thin Films and Physics of Nanostructures, Department of Physics, Bielefeld University, Universitätsstrasse 25, D-33615 Bielefeld, Germany;3. Department of Inorganic Chemistry, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-14195 Berlin, Germany;4. Institute of Solid State Physics, Vienna University of Technology, Wiedner Hauptstrasse 8-10, A-1040 Wien, Austria;1. Electron Microscopy for Materials Science (EMAT), University of Antwerp, Gronenborgerlaan 171, 2020 Antwerp, Belgium;2. Institut für Festkörperphysik, Universität Bremen, Otto-Hahn-Alle 1, D-28359 Bremen, Germany;1. Helmholtz Zentrum Berlin für Materialien und Energie, Hahn-Meitner-Platz 1, D-14109 Berlin, Germany;2. Institute for Mathematical Stochastics,Georg-August-University of Göttingen, Goldschmidtstrasse 7, D-37077 Göttingen, Germany;1. National Laboratory of Solid State Microstructures and College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, People''s Republic of China;2. Department of Materials Science and Engineering, University of Michigan-Ann Arbor, Ann Arbor, MI 48109, USA;1. Laboratory for Ultrafast Microscopy and Electron Scattering, LUMES, ICMP, Ecole polytechnique fédérale de Lausanne, CH-1015 Lausanne, Switzerland;2. Department of Physics and Astronomy, UCLA, Los Angeles, CA 90095, USA;3. Eindhoven University of Technology, Department of Applied Physics, P.O. Box 513, 5600 MB Eindhoven, The Netherlands |
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| Abstract: | All micrographs are limited by shot-noise, which is intrinsic to the detection process of electrons. For beam insensitive specimen this limitation can in principle easily be circumvented by prolonged exposure times. However, in the high-resolution regime several instrumental instabilities limit the applicable exposure time. Particularly in the case of off-axis holography the holograms are highly sensitive to the position and voltage of the electron-optical biprism. We present a novel reconstruction algorithm to average series of off-axis holograms while compensating for specimen drift, biprism drift, drift of biprism voltage, and drift of defocus, which all might cause problematic changes from exposure to exposure. We show an application of the algorithm utilizing also the possibilities of double biprism holography, which results in a high quality exit-wave reconstruction with 75 pm resolution at a very high signal-to-noise ratio. |
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| Keywords: | Off-axis electron holography High-resolution transmission electron microscopy Iterative reconstruction |
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