EPMA Measurements of Diffusion Profiles at the Submicrometre Scale |
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Authors: | Olivier Arnould François Hild |
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Institution: | (1) LMT-Cachan, ENS de Cachan, CNRS-UMR 8535, Université Paris VI, 61 avenue du Président Wilson, F-94235 Cachan Cedex, France, FR |
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Abstract: | Concentration profiles due to (inter)diffusion in materials may require high spatial resolution. These profiles may be measured
by electron probe microanalysis, which allows one to determine the elemental composition with a good accuracy provided measurement
‘artefacts’ can be accounted for. Standard phenomena are usually corrected by commercial softwares that assume a homogeneous
elemental composition in the analysed area. However, in the case of a diffusion process on a small scale, the composition
is no longer homogeneous and the effect of the hemispherical volume of the X-ray emission on the spatial resolution of the
concentration profiles, and consequently on the diffusion coefficients, has to be considered. Moreover, (secondary) fluorescence
across interfaces or interphases has to be evaluated. A radial X-ray distribution associated with the characteristic depth
distribution, φ(ρz), allows for the definition of a 2D X-ray emission function that enables the computation of the entire process for a given
concentration profile. |
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Keywords: | : EPMA concentration profiles average effect (secondary) fluorescence interface |
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