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ZnO-Bi2O3系压敏陶瓷的导电过程与等效势垒高度
引用本文:成鹏飞,李盛涛,焦兴六. ZnO-Bi2O3系压敏陶瓷的导电过程与等效势垒高度[J]. 物理学报, 2006, 55(8): 4253-4258
作者姓名:成鹏飞  李盛涛  焦兴六
作者单位:西安交通大学电力设备电气绝缘国家重点实验室,西安 710049
基金项目:国家自然科学基金(批准号:50477023)资助的课题.
摘    要:研究了ZnO-Bi2O3系压敏陶瓷等效势垒高度eff随着归一化电压的变化规律,发现等效势垒高度eff随着归一化电压的增加先逐渐增大,达到最大值后持续下降.由于在外加电压作用下反偏势垒高度高于正偏势垒高度,等效势垒高度eff主要取决于反偏势垒.因此,这种变化规律说明了ZnO压敏陶瓷晶界的导电过程可能存在三个阶段.在低归一化电压区,晶界区域中的电子从正偏势垒区注入到晶界无序层的速率低于电子从晶界无序关键词:ZnO压敏陶瓷归一化电压等效势垒高度导电过程

关 键 词:ZnO压敏陶瓷  归一化电压  等效势垒高度  导电过程
文章编号:1000-3290/2006/55(08)/4253-06
收稿时间:2005-12-12
修稿时间:2005-12-122006-03-27

The conduction process and the equivalent barrier height in ZnO-Bi2O3 based varistor ceramics
Cheng Peng-Fei,Li Sheng-Tao and Jiao Xing-Liu. The conduction process and the equivalent barrier height in ZnO-Bi2O3 based varistor ceramics[J]. Acta Physica Sinica, 2006, 55(8): 4253-4258
Authors:Cheng Peng-Fei  Li Sheng-Tao  Jiao Xing-Liu
Abstract:The relationship between the equivalent barrier height of ZnO-Bi2O3 based varistor ceramics and normalized applied voltage was studied and it was found that the equivalent barrier height is influenced by normalized voltage greatly. With the increase of normalized voltage the equivalent barrier height increases firstly, then changes little and finally decreases quickly. Because the Schottky barrier height at the reverse-biased side is higher than that at the forward-biased side, the equivalent barrier height is determined by the former. The changing trend of the equivalent barrier height with normalized voltage indicates three steps of conduction. Firstly, in low normalized voltage range the velocity of electron injection from the forward-biased barrier area into the amorphous layer at grain-boundary is lower than that of ejection from traps in the amorphous layer into the reverse-biased barrier area. Thus the equivalent barrier height increases with the growth of normalized voltage. Secondly, in medium normalized voltage range, the injection velocity and the ejection velocity of electron is equal and the equivalent barrier height reaches its maximum value. Finally, in high normalized voltage range the injection velocity of electron is quicker than the ejection velocity of electron and the equivalent barrier decreases with the increase of the normalized voltage. In the end the Schottky barrier will break electrically. At the same time the relationship between the equivalent barrier height and the leakage current was analyzed and it was found that the leakage current is determined by an exponential function of the difference between the equivalent barrier heights when normalized voltage is 1 and 0.75.
Keywords:ZnO varistor ceramics   normalized voltage   equivalent barrier height   conduction process
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