Novel attributes in the performance and scaling effects of carbon nanotube field-effect transistors with halo doping

In this paper, we performed a comprehensive scaling study of a carbon nanotube field-effect transistor (CNTFET) with halo doping (HD) using self-consistent and atomistic scale simulations. Our simulation results demonstrate that drain induced barrier lowering (DIBL) diminishes in the HD-CNTFET due to a step in the potential of the CNT at the interface of p-doped and undoped regions in the channel. Also, the hot carrier effect minimizes with reduction of the peak of the electric field at the drain side of the HD-CNTFET. Moreover, the features of the HD-CNTFET can be controlled by the length and concentration engineering of the HD region. Leakage current, on–off current ratio and subthreshold swing improve with an increase of the length and concentration of the HD region, due to the increment of the threshold voltage and the barrier height of the p–n junction near the source. Therefore, this work can provide an incentive for further experimental exploration.