Plasma fluorination of polystyrene

ESCA and contact-angle measurements were used to characterize the surfaces of polystyrene films exposed to SF₆, CF₄, and C₂F₆ plasmas. SF₆ plasmas cause loss of aromaticity in the polystyrene surface region via saturation of the phenyl ring and/or carbon-bond breakage and subsequent fluorination. C₂F₆ plasmas graft CF_x radicals directly to the polystyrene surface without necessarily destroying the aromaticity of the polymer. CF₄ plasmas appear to be intermediate in character between SF₆ and C₂F₆ plasmas.