Hierarchical Pore Development by Plasma Etching of Zr‐Based Metal–Organic Frameworks |
| |
| Authors: | Dr. Jared B. DeCoste Dr. Joseph A. Rossin Gregory W. Peterson |
| |
| Affiliation: | 1. Leidos, Inc., PO Box 68, Gunpowder, MD 21010 (USA);2. Guild Associates, Inc., 5750 Shier Rings Rd, Dublin, OH 43228 (USA);3. U.S. Army Edgewood Chemical Biological Center, 5183 Blackhawk Rd, APG, MD 20101 (USA) |
| |
| Abstract: | The typically stable Zr‐based metal–organic frameworks (MOFs) UiO‐66 and UiO‐66‐NH2 were treated with tetrafluoromethane (CF4) and hexafluoroethane (C2F6) plasmas. Through interactions between fluoride radicals from the perfluoroalkane plasma and the zirconium–oxygen bonds of the MOF, the resulting materials showed the development of mesoporosity, creating a hierarchical pore structure. It is anticipated that this strategy can be used as a post‐synthetic technique for developing hierarchical networks in a variety of MOFs. |
| |
| Keywords: | hierarchical porosity mesoporous materials metal– organic frameworks plasma etching UiO‐66 |
|
|
