|
|||||
|
|
UV laser-induced photolysis of 1,3-disilacyclobutane in oxygen for chemical vapour deposition of nano-sized polyoxocarbosilane films |
|
| Authors: | Josef Pola, Josef Ví tek, Zdenk Bastl,Jan ubrt |
| Affiliation: | Josef Pola, Josef Vítek, Zden |
| Abstract: | The multi-pulse ArF laser irradiation into gaseous 1,3-disilacyclobutane–O2 mixture in excess of buffer gas occurs as non-explosive chemical vapour deposition of solid methylsilicone films, whereas the single-pulse irradiation into the gaseous mixture in the absence of buffer gas results in explosive chemical vapour deposition of solid nano-structured polyoxocarbosilanes poor in hydrogen. |
| Keywords: | 1,3-Disilacyclobutane Silene Oxidation Laser photolysis Nanostructured polyoxocarbosilane |
| 本文献已被 ScienceDirect 等数据库收录！ | |