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有机硅化合物-金属氧化物绝缘保护材料在制造高压晶闸管中的应用研究
引用本文:刘秀喜,王公堂.有机硅化合物-金属氧化物绝缘保护材料在制造高压晶闸管中的应用研究[J].物理学报,2008,57(1):576-580.
作者姓名:刘秀喜  王公堂
作者单位:山东师范大学物理与电子科学学院,济南 250014
基金项目:山东省自然科学基金(批准号:Y2003A01)资助的课题.
摘    要:采用高纯有机硅化合物和金属氧化物,按比例均匀混合制成糊状材料,涂敷于器件台表面,用于半导体p-n结表面特性的控制和保护.固化后该材料在室温下的体电阻率大于7.5×1015Ω·cm,介电常数为4.7,击穿电压高于16 kV/mm.该材料用于KP500型晶闸管表面保护,能明显改善器件的表面特性、减少漏电流和提高耐压水平,并对提高器件性能的机理进行了研究. 关键词: 绝缘保护材料 性能 晶闸管 机理

关 键 词:绝缘保护材料  性能  晶闸管  机理
文章编号:1000-3290-(2008)01-0576-05
收稿时间:2007-04-28
修稿时间:2007-05-29

Fabrication of high voltage thyristor based on silicon organic compounds and metal oxides type isolation protective material
Liu Xiu-Xi,Wang Gong-Tang.Fabrication of high voltage thyristor based on silicon organic compounds and metal oxides type isolation protective material[J].Acta Physica Sinica,2008,57(1):576-580.
Authors:Liu Xiu-Xi  Wang Gong-Tang
Abstract:In this paper, we present some experimental results of the KP 500 thyristor which are fabricated by using silicon organic compounds and metal oxides type isolation material. Investigation on the principles of quality control of the semiconductor devices is also reported. The technique was based on coating the device surfaces with the mixture of high purity silicon organic compounds and metal oxides at a proper mixing ratio to protect the semiconductor p-n junction surface aswell as to control the characteristic properties. At room temperature, the resistivity of the solid isolation protective material ρ>7.5×1015Ω·cm, its dielectric constant is equal to 4.7, and the breakdown voltage V>16kV/mm. We demonstrated the advantages of using this material on KP500 thyristor by significantly improving its surface properties, reducing the leakage current and increasing its voltage breakdown level.
Keywords:isolation protective material  performance  thyristor  mechanism
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