Photoablation of polyurethane films using UV laser pulses

Pulsed ultraviolet laser ablation of two polyurethane films has been studied in terms of ablation rate behaviour and time-of-flight mass spectroscopy of the positively charged photofragments. Three excimer laser wavelengths (193, 248 and 308 nm; 17–30 ns pulse duration) and short-pulse laser system (pulse duration 500 fs or 5 ps, at 248 nm) were employed. The results of the influence of energy fluence on the ablation rate are tested against other photoablation models and a table of fitted physical constants is presented. The upper limit of the mean activation energy for desorption is found to be considerably lower than the energy required to break single covalent bonds. The mass analysis of the positively charged species produced during the photoablation process provides valuable insight into the photofragmentation mechanism.