Effect of amorphous C films deposited by RF magnetron sputtering on smoothing K9 glass substrate |
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Authors: | Songwen Deng Hongji Qi Kui Yi Jianda Shao |
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Affiliation: | a Optical Films Technology R & D Center, Shanghai Institute of Optics and Fine Mechanics, The Chinese Academy of Sciences, Shanghai, 201800, PR China b Graduate School of Chinese Academy of Sciences, Beijing 100038, PR China |
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Abstract: | Soft X-ray multilayer reflectors must be deposited on super-smooth surface such as super-polished silicon wafers or glasses, which are complicate, time-consuming and expensive to produce. To overcome this shortage, C films deposited by RF magnetron sputtering were considered to smooth the K9 glass substrates’ surface in the present paper. The structure of C films was systematically studied by XRD and Raman spectrum. The surface morphology and rms-roughness were obtained by AFM. Then, we calculated the impact of the C layers on the reflectivity curve of Mo/Si soft X-ray multilayer reflector around 13.5 nm. The C films exhibit typical amorphous state. With the increasing of power and thickness, the content of sp3 hybrid bonding decreases while the amount or size of well-organized graphite clusters increases. The surface rms-roughness decreases from 2.4 nm to 0.62 nm after smoothed by an 80 nm thick C layer deposited in 500 W, which is the smoothest C layer surface we have obtained. The calculation results show that the theoretical normal incidence reflectivity of Mo/Si multilayer at 13.5 nm increases from 7% to 63%. |
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Keywords: | Roughness Smoothing effect C film Soft X-ray multilayer reflector |
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