| 局部屏蔽法在X—Ray残余应力测量中的应用 |
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| 引用本文： | 徐学东 张亦良. 局部屏蔽法在X—Ray残余应力测量中的应用[J]. 实验力学, 1997, 12(1): 135-138 |
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| 作者姓名： | 徐学东 张亦良 |
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| 作者单位： | 北京工业大学 |
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| 摘 要： | 本文所述的局部屏蔽法即是在Ｘ射线测量过程中的下遮挡法，即是将被测部位暴露出来，而将其余部位进行遮挡以对Ｘ射线进行屏蔽。局部屏蔽法是解决应力梯度测量中的一种有效方法，本文解决了遮挡法的关键问题并取得了良好的效果
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| 关 键 词： | 屏蔽膜，X射线，残余应力 |
Application of Local Covered X Ray Technique to Residual Stress Measurement |
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| Xu Xuedong Zhang Yiliang Cheng Yongmei. Application of Local Covered X Ray Technique to Residual Stress Measurement[J]. Journal of Experimental Mechanics, 1997, 12(1): 135-138 |
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| Authors: | Xu Xuedong Zhang Yiliang Cheng Yongmei |
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| Affiliation: | Beijing Polytechnic University |
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| Abstract: | The local covered X ray technique used in the process of residual stress measurement is a technique means that the concerned area is exposed and the rest of area can be screened from X ray.This technique is an efficient method for measuring the area with stress gradient.The key technique is presented in this paper and good results are obtained. |
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| Keywords: | screen film X ray residual stress. |
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