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Analysis method of the effect of fabrication errors on a planar waveguide demultiplexer |
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| Authors: | Jun Song Ning Zhu |
| Affiliation: | (1) State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Centre for Optical and Electromagnetic Research, East Building No.5, Zijingang Campus, Hangzhou, 310058, China;(2) Division of Electromagnetic Theory, Royal Institute of Technology, Alfven Laboratory, 100 44 Stockholm, Sweden |
| Abstract: | The impact of fabrication errors on a planar waveguide demultiplexer is analyzed based on an analytical method. The explicit expression of the transfer function taking into account phase and amplitude errors is presented in order to analyze the loss and crosstalk of the demultiplexer caused by fabrication errors. A basic requirement for the demultiplexer with a certain crosstalk criterion can be easily obtained. Using an etched diffraction grating demultiplexer as an example, it is shown that the analytical results have a good agreement with results from a numerical method. |
| Keywords: | planar waveguide demultiplexer etched diffraction grating (EDG) phase and amplitude errors loss crosstalk WDM |
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