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Effect of plasma sheath structure in plasma focus
Authors:Xin Xin Wang Tsin Chi Yang
Affiliation:Dept. of Electr. Eng., Tsinghua Univ., Beijing ;
Abstract:The development of plasma sheath in the run-down phase and pinch phase in a plasma focus is studied with laser interferometry. The time-resolved interferograms show that the structures of plasma sheaths in the run-down phase are different at low and high pressures of filling gas. This leads to a distinct plasma pattern above the anode. At low pressure the plasma sheath in the run-down phase has clear boundaries, resulting in better compression in the pinch phase and a higher X-ray yield. At high pressure the plasma sheath is turbulent at the back side and become disordered in the pinch phase, giving little or no X-ray emission. The effect of a ceiling, i.e., a metal plate placed above the anode, is investigated. With the ceiling the reproducibility of X-ray emission is much improved
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