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| 引用本文： | 齐雪莲,任春生,张健,麻冰欣,马腾才.?????????????????Cu??????[J].核聚变与等离子体物理,2007,27(3):264-268. |
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| 作者姓名： | 齐雪莲 任春生 张健 麻冰欣 马腾才 |
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| 作者单位： | (????????????????????????????????????? 116024) |
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| 基金项目： | 国家自然科学基金资助项目(50277003和10505005) |
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| 摘 要： | 用射频等离子体增强非平衡磁控溅射在Si100基底上沉积了金属Cu膜。研究了偏压,射频功率和磁场等沉积参数对膜性能的影响。用扫描电子显微镜(SEM)、原子力显微镜(AFM)、X射线衍射(XRD)和电子能谱(EM)检测了膜的表面形貌,结构和成分。结果表明,射频放电有利于表面均匀光滑、电导率高的Cu沉积膜的形成;沉积参数对沉积膜的性能有重要的影响。
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| 关 键 词： | 射频 非平衡磁控溅射 Cu膜 |
| 文章编号： | 0254-6086（2007）03-0264-05 |
| 修稿时间： | 2006-10-07 |
Radio-frequency influences on Cu film deposited by unbalanced magnetron sputtering |
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| QI Xue-lian,REN Chun-sheng,ZHANG Jian,MA Bing-xin,MA Teng-cai.Radio-frequency influences on Cu film deposited by unbalanced magnetron sputtering[J].Nuclear Fusion and Plasma Physics,2007,27(3):264-268. |
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| Authors: | QI Xue-lian REN Chun-sheng ZHANG Jian MA Bing-xin MA Teng-cai |
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| Institution: | (State Key Lab of Materials Modification by laser, electron and ion beams, Dalian University of Technology, Dalian 116024) |
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| Abstract: | Metallic copper films are deposited on Si100 substrate by radio-frequency plasma enhanced unbalanced magnetron sputtering,and film performance is studied by changing deposition parameters such as bias voltage,rf power and magnetron.The morphology,structure and element of the films are examined by scanning electron microscopy,atomic force microscope(AFM),X-ray diffraction(XRD) and electron spectroscopy(EM).The results show that rf discharge has advantages in depositing equality smooth and high conductivity Cu film and deposition parameters are important for film performance. |
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| Keywords: | Radio-frequency Unbalanced magnetron sputtering Cu film |
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