| X射线荧光光谱分析 |
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| 引用本文： | 陶光仪. X射线荧光光谱分析[J]. 分析试验室, 1997, 16(3): 94-100 |
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| 作者姓名： | 陶光仪 |
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| 作者单位： | Shanghai Institute of Ceramics，Academia Sinica，Shanghai 200050 |
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| 摘 要： | 本文是“分析试验室”定期评述中“Ｘ射线荧光光谱法”学科的第六篇评述，它收集了国内学者１９９４年７月到１９９６年６月期间发表的在国内外刊物上的１４９篇文章，并对此期间我国Ｘ射线荧光光谱分析的概况和发展进行评述，内容包括ＸＲＦ仪器，同步辐射ＸＲＦ，全反射ＸＲＦ，粒子激发Ｘ射线发射光谱，定量，定性和化学态分析方法，制样技术，以及在各个科学和工业领域中的应用。
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| 关 键 词： | X射线荧光光谱 XRF SXRF PIXE |
Progress in X Ray Fluorescence Analysis |
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| Tao Guangyi. Progress in X Ray Fluorescence Analysis[J]. Chinese Journal of Analysis Laboratory, 1997, 16(3): 94-100 |
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| Authors: | Tao Guangyi |
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| Abstract: | The present review covers the period of July 1994 to June 1996 during which 149 papers on X Ray Fluorescence Analysis were published mainly by Chinese scientists.The overview,developments of XRF instrumentation ,synchrotron X Ray fluorescence,total reflection X Ray fluorescence,partical induced X Ray emission,quantitative,qualitative and chemical state analysis ,sample preparation and applications are focused on and totally 159 references are cited in this review. |
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| Keywords: | X ray fluorescence analysis sychrotron X ray fluorescence analysis total reflection X ray fluoresence analysis partical induced X ray emission analysis quantitative analysis sample preparation review |
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