A method to pattern Pd over-layers on GdMg films and its application to increase the transmittance of metal hydride optical switches |
| |
| Authors: | R. Armitage M. Cich M. Rubin E.R. Weber |
| |
| Affiliation: | (1) Department of Materials Science and Engineering, Mail Code #1760, University of California, Berkeley, CA 94720, USA, US;(2) Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA, US |
| |
| Abstract: | A process to pattern Pd over-layers on reactive metal films was developed using ion milling through a tungsten trioxide mask patterned by photolithography and wet etching. The WO3 mask exhibited a low Ar+ sputter yield and, unlike conventional mask materials (SiO2, Si3N4), was easily etched in a mild alkaline solution. This procedure was applied to convert a 20-nm Pd cap over a 160-nm GdMg film to a Pd grid with ≈9-μm-diameter openings covering ≈40% of the surface. The Pd grid proved sufficient to catalyze the (de)hydriding reactions required to reversibly switch the GdMg film from reflecting to transparent. The maximum transmittance of the patterned Pd/GdMg hydride bi-layer was twice that of an otherwise identical sample with a continuous Pd cap, with similar hydriding kinetics. Received: 2 May 2000 / Accepted: 9 May 2000 / Published online: 13 September 2000 |
| |
| Keywords: | PACS: 52.75.Rx 85.40.Hp 42.70.-a |
| 本文献已被 SpringerLink 等数据库收录！ |
|
