Surface modification of SiO2 glass by laser processing |
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Authors: | Jay J.L Yi Peter R Struit |
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Affiliation: | The University of Connecticut, Institute of Materials Science, Box U-136, Storrs, CT 06269, USA |
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Abstract: | Various oxide films on SiO2 glass substrates were irradiated by a laser beam. A continuous CO2 laser source (wavelength 10.6 μm) was used for this purpose; the composition change at the surface layer was determined by Rutherford backscattering spectrometry (RBS). All the alkaline-earth oxides as well as those of lanthanum and yttrium, entered the glass after treatment. ZrO2 and CeO2, however, did not enter the SiO2 glass due to laser irradiation. It is interesting, however, that a film of ZrO2 + Al2O mixture easily entered into the SiO2 glass by laser processing. The conditions and mechanism of laser-enhanced interaction of ZrO2 or other oxide films with SiO2 glass surfaces are discussed especially in view of their structural behaviour in glass. |
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