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Top-down patterning of zeolitic imidazolate framework composite thin films by deep X-ray lithography
Authors:Dimitrakakis Constantinos  Marmiroli Benedetta  Amenitsch Heinz  Malfatti Luca  Innocenzi Plinio  Grenci Gianluca  Vaccari Lisa  Hill Anita J  Ladewig Bradley P  Hill Matthew R  Falcaro Paolo
Affiliation:Division of Materials Science and Engineering, CSIRO, Private Bag 33, Clayton South MDC 3169, Australia.
Abstract:For the first time a top-down process was used to control the spatial location of Metal-Organic Frameworks on a surface. Deep X-ray lithography was utilised to micropattern a Zeolitic Imidazolate Framework layer on a sol-gel surface, with exposure hardening the sol-gel by inducing crosslinking while leaving the frameworks intact.
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