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| Photoluminescence Properties of Two-dimensional Planar Layer and Three-dimensional Island Layer for ZnO Films Grown Using MOCVD | |
| 作者姓名： | HUANG Ke-ke HOU Chang-min GAO Zhong-min LI Xiang-shan FENG Shou-hua ZHANG Yuan-tao ZHU Hui-chao DU Guo-tong |
| 作者单位： | HUANG Ke-ke~1，HOU Chang-min~1，GAO Zhong-min~1，LI Xiang-shan~1，FENG Shou-hua~ 1**，ZHANG Yuan-tao~2，ZHU Hui-chao~2 and DU Guo-tong~2 1. State Key Laboratory of Inorganic Synthesis and Preparative Chemistry; 2. Department of Electronic Science and Engineering，Jilin University，Changchun 130012，P. R. China |
| 摘 要： | IntroductionOver the past few years, wide band gap semicon-ductors have attracted considerable attention because oftheir high commercial demand for the preparation ofblue and UV light emitters. The most promising amongall the known materials used for this… |
| 关 键 词： | 氮化镓半导体 氧化锌薄膜 金属有机化学汽相淀积 光致发光 平面层 岛式层 |
| 文章编号： | 1005-9040（2006）-06-692-04 |
| 收稿时间： | 2005-11-21 |
Photoluminescence Properties of Two-dimensional Planar Layer and Three-dimensional Island Layer for ZnO Films Grown Using MOCVD |
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| HUANG Ke-ke HOU Chang-min GAO Zhong-min LI Xiang-shan FENG Shou-hua ZHANG Yuan-tao ZHU Hui-chao DU Guo-tong.Photoluminescence Properties of Two-dimensional Planar Layer and Three-dimensional Island Layer for ZnO Films Grown Using MOCVD[J].Chemical Research in Chinese University,2006,22(6):692-695. | |
| Authors: | Ke-ke HUANG Chang-min HOU Zhong-min GAO Xiang-shan LI Shou-hua FENG Yuan-tao ZHANG Hui-chao ZHU Guo-tong DU |
| Institution: | aState Key Laboratory of Inorganic Synthesis and Preparative Chemistry bDepartment of Electronic Science and Engineering, Jilin University, Changchun 130012, P. R. China |
| Abstract: | ZnO(002) films with different thicknesses ranging from 7 to 300 nm were grown on sapphire(006) substrates via metal-organic chemical vapor deposition(MOCVD). The two-dimensional(2D) planar layer and the three-dimensional(3D) island layer were studied by using of X-ray diffraction(XRD) rocking curves and atomic force microscopy(AFM). The room temperature photoluminescence(PL) spectra show a blue shift of the peak positions of the ultraviolet(UV) emission with increasing film thickness. The blue shift is remarkably high(393_380 nm) when an increase in film thickness(7_15 nm) is accompanied by the change of structure from a 2D planar layer to a 3D island layer. The PL spectra at 77 K also indicate that there are different transition mechanisms in the film thickness from a 2D planar layer to a 3D island layer near the 2D layer region. |
| Keywords: | ZnO films Metal-organic chemical vapor deposition(MOCVD) Photoluminescence Planar layer Island layer |
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