| 金刚石薄膜电化学 |
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| 引用本文： | 只金芳,田如海. 金刚石薄膜电化学[J]. 化学进展, 2005, 17(1): 0-63 |
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| 作者姓名： | 只金芳 田如海 |
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| 作者单位： | 中国科学院理化技术研究所,北京,100101;中国科学院理化技术研究所,北京,100101 |
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| 摘 要： | 金刚石由于其特殊的物理与化学性质,早在几百年前就吸引了人们对它的关注.化学气相沉积(chemical vapor deposition,CVD)法制备的高掺杂硼复合多晶金刚石薄膜,为金刚石薄膜在电化学中的应用开辟了新的领域.作为新型碳素电极材料,高掺杂硼复合多晶金刚石薄膜具有许多目前使用的电极材料所不可比拟的优异特性如:宽电化学势窗,低残留电流,极好的电化学稳定性以及表面不易被污染等.本文综述了高掺杂硼复合多晶金刚石薄膜电极在电化学中的几个重要应用,包括电分析、电合成及电化学法处理废水等.
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| 关 键 词： | 硼掺杂 金刚石薄膜 电极 电化学 |
| 文章编号： | 1005-281X(2005)01-0055-09 |
| 收稿时间： | 2003-11-01 |
| 修稿时间： | 2003-11-01 |
Electrochemistry of Diamond Thin Film |
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| Zhi Jinfang,Tian Ruhai. Electrochemistry of Diamond Thin Film[J]. Progress in Chemistry, 2005, 17(1): 0-63 |
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| Authors: | Zhi Jinfang Tian Ruhai |
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| Affiliation: | Technical Institute of Physics and Chemistry, Chinese Academy of Sciences,Beijing 100101,China |
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| Abstract: | Diamond has received great interest for its excellent physical and chemical properties since several hundred years ago. Highly boron-doped diamond(BDD) polycrystalline thin films fabricated by CVD opened new frontiers of diamond thin film application in electrochemical fields. As a new carbon-based electrode material, BDD electrode is superior to many other carbon-based and metal electrode materials. It possesses many unique electrochemical properties, including a wide potential window, very low background current, and extreme chemical stability to deactivation via fouling. Several important applications of BDD electrode in electroanalysis, electrosynthesis and electrochemical wastewater treatment are summarized. |
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| Keywords: | boron-doped diamond thin film electrode electrochemistry |
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