| 溅射功率对Mo薄膜微结构和性能的影响 |
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| 引用本文： | 廖国,何智兵,陈太红,许华,李俊,谌加军,唐永建. 溅射功率对Mo薄膜微结构和性能的影响[J]. 强激光与粒子束, 2011, 23(9). DOI: 10.3788/HPLPB20112309.2386 |
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| 作者姓名： | 廖国 何智兵 陈太红 许华 李俊 谌加军 唐永建 |
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| 作者单位： | 1. 西华师范大学 物理与电子信息学院, 四川 南充 637002; 2. 中国工程物理研究院 激光聚变研究中心 等离子体物理重点实验室, 四川 绵阳 621900 |
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| 基金项目： | 中国工程物理研究院等离子体物理重点实验室基金项目(9140c680501007); 西华师范大学大学生科技创新基金项目(42710071); 四川省教育厅资助课题(1010ZC119) |
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| 摘 要： | 实验采用直流磁控溅射沉积技术在不同溅射功率下制备Mo膜,研究了不同溅射功率下Mo膜的沉积速率、表面形貌及晶型结构,并对其晶粒尺寸和应力进行了研究。利用原子力显微镜观察样品的表面形貌发现随着溅射功率的增加,薄膜表面粗糙度逐渐增大。X射线衍射分析表明薄膜呈立方多晶结构,晶粒尺寸为14.1～17.9 nm;应力先随溅射功率的增大而增大,在40 W时达到最大值(2.383 GPa),后随溅射功率的增大有所减小。
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| 关 键 词： | 直流磁控溅射 Mo薄膜 溅射功率 表面形貌 X射线衍射 |
| 收稿时间： | 1900-01-01; |
Effects of sputtering power on structure and property of Mo films deposited by DC magnetron sputtering |
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| Liao Guo,He Zhibing,Chen Taihong,Xu Hua,Li Jun,Chen Jiajun,Tang Yongjian. Effects of sputtering power on structure and property of Mo films deposited by DC magnetron sputtering[J]. High Power Laser and Particle Beams, 2011, 23(9). DOI: 10.3788/HPLPB20112309.2386 |
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| Authors: | Liao Guo He Zhibing Chen Taihong Xu Hua Li Jun Chen Jiajun Tang Yongjian |
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| Affiliation: | (1. School of Physics and Electronic Information， China West Normal University， Nanchong 637002, China; 2. Science and Technology on Plasma Physics Laboratory, Research Center of Laser Fusion, CAEP, P. O. Box 919-987, Mianyang 621900, China） |
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| Abstract: | Mo films were fabricated at different sputtering powers by DC magnetron sputtering.The deposition rate,surface topography and crystal structure of Mo films were studied.The effects of sputtering power on grain size and stress of Mo films were discussed.AFM analyses show that when sputtering power increases from 20 W to 100 W,the roughness of Mo films raises.The X-ray diffraction analysis indicates that all the films are in cubic polycrystal structure.The grain size varies from 14.1 nm to 17.9 nm,and the str... |
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| Keywords: | DC magnetron sputtering Mo film sputtering power surface topography X-ray diffraction |
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