首页 | 本学科首页   官方微博 | 高级检索  
     


Strong water repellency effect on SiO2 films processed at a nanometric scale
Authors:S. M.M. Ramos  A. Benyagoub  B. Canut  P. De Dieuleveult  G. Messin
Affiliation:(1) Laboratoire PMCN, Université Lyon 1, UMR CNRS 5586, 69622 Villeurbanne Cedex, France;(2) Centre Interdisciplinaire de Recherche Ions Laser, CIRIL-GANIL, BP 5133, 14070 Caen Cedex 5, France;(3) Institut de Nanotechnologie de Lyon, Université Lyon 1, CNRS, UMR 5270, 69622 Villeurbanne Cedex, France;(4) Institut des Sciences et Techniques de l'Ingénieur de Lyon, Université Lyon1, 69622 Villeurbanne Cedex, France
Abstract:The present study deals with the creation of nano-rough surfaces with stable and controlled high hydrophobicity. These surfaces were obtained by combining the ion track etching technique with a simple functionalization by grafting perfluoroctyltrichlorosilane (PFOTS) molecules. Surface morphology was investigated by AFM observations which evidenced a self-affine fractal structure with a fractal dimension Df ~ 2.6. The study of the wetting properties of these surfaces allowed to elucidate the conditions for observing a high hydrophobicity phenomenon and to predict the contact angle values for surfaces designed at a nanometric scale.
Keywords:  KeywordHeading"  >PACS. 68.08.Bc Wetting  61.46.-w Nanoscale materials  81.07.-b Nanoscale materials and structures: fabrication and characterization  61.80.-x Physical radiation effects, radiation damage
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号