首页 | 本学科首页   官方微博 | 高级检索  
     


Relaxation of Mechanical Stress in Epitaxial Films of Cubic Silicon Carbide on Silicon Substrates with a Buffer Porous Layer
Authors:Gusev  A. S.  Kargin  N. I.  Ryndya  S. M.  Safaraliev  G. K.  Siglovaya  N. V.  Smirnova  M. O.  Solomatin  I. O.  Sultanov  A. O.  Timofeev  A. A.
Affiliation:1.National Research Nuclear University “Moscow Engineering Physics Institute”, 115409, Moscow, Russia
;
Abstract:Technical Physics - The results of this study quantitatively and qualitatively illustrate the processes of mismatch stress relaxation upon epitaxy of cubic silicon carbide on silicon. The...
Keywords:
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号