The Influence of Film Thickness on Annealing-Induced Grain Growth in Pt Films |
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Authors: | Selyukov R. V. Naumov V. V. Vasilev S. V. |
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Affiliation: | 1.Institute of Physics and Technology, Yaroslavl Branch, Russian Academy of Sciences, Yaroslavl, 150007, Russia ; |
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Abstract: | Technical Physics - Pt films with thickness h = 20–100 nm deposited on oxidized с-Si(100) substrate have been subjected to vacuum annealing at 500°C for 1 h, which resulted in... |
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