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Dependence of Mechanical and Tribological Properties of a-C:H:SiOx Films on the Bias Voltage Amplitude of the Substrate |
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| Authors: | Grenadyorov A S Solovyev A A Oskomov K V Zhulkov M O |
| Institution: | 1.Institute of High-Current Electronics, Siberian Branch, Russian Academy of Sciences, 634055, Tomsk, Russia ;2.National Medical Research Center Named after Academician Meshalkin, 630055, Novosibirsk, Russia ; |
| Abstract: | Technical Physics - The surface of AISI 316L stainless steel has been modified by depositing an a-C:H:SiOx film using plasma-assisted chemical vapor-phase deposition with the application of a... |
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