Plasma homo- and copolymerizations of tetrafluoroethylene and chlorotrifluoroethylene |
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Authors: | Morton A Golub Theodore Wydeven Lorie S Finney |
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Institution: | (1) NASA Ames Research Center, 94035-1000 Moffett Field, California;(2) NASA Ames Research Center, Bionetics Corporation, 94035-1000 Moffett Field, California;(3) Surface Science Laboratories, 1200 Charleston Road, 94043 Mountain View, California |
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Abstract: | The plasma homo- and copolymerizations of tetrafluoroethylene (TFE) and chlorotrifluoroethylene (CTFE) in a capacitively coupled
tubular reactor (TR) with external electrodes were studied by means of microgravimetry and FT-IR and XPS analyses. The deposition
rates for CTFE/TFE plasma copolymers, as well as the ratios of IR absorbances at 1180 and 1225 cm−1, and the XPS-derived Cl/C and F/C ratios, varied regularly with mol % CTFE in the feed, all of which results were dependent
upon the rf power at which the plasma copolymerizations were conducted. The deposition rates for the plasma homopolymers of
TFE (PPTFE) and CTFE (PPTCFE) depended markedly on rf power (W) and monomer molar flow rate (F). The F/C ratio for PPTFE was nearly independent of the composite parameter,W/FM (whereM is the monomer molecular weight), while for PPCTFE, the F/C ratio decreased significantly and the Cl/C ratio increased slightly
with increase inW/FM. The percentage of carbon as CF3 was 20–24% in PPTFE and 7–14% in PPCTFE. Plots of deposition rate versusW/FM for PPTFE and PPCTFE obtained in a TR differed considerably from corresponding plots in the literature for the same homopolymers
prepared in a glass-cross or bell-jar reactor. |
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Keywords: | Plasma polymerization plasma copolymerization tetrafluoroethylene chlorotrifluoroethylene infrared spectroscopy X-ray photoelectron spectroscopy deposition rates plasma process parameters |
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