High temperature X-ray diffraction studies of the crystallization process of thin amorphous films with the chemical composition CrSi2.57 |
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| Authors: | W. Pitschke M. Koch A. Heinrich J. Schumann |
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| Affiliation: | 1. IFW Dresden e. V., PF, D-01171, Dresden, Germany
2. TU Dresden, Mommsenstrasse 13, D-01069, Dresden, Germany
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| Abstract: | The crystallization process of amorphous thin films with the chemical composition CrSi2.57 has been investigated by means of high temperature X-ray diffractometry. The crystallization of the amorphous as-deposited films takes place in two stages; in the first stage CrSi2 is formed and in the second Si, resulting in a two component nano-disperse structure. The results are in agreement with investigations of the thermopower and the electrical conductivity [5, 6]. |
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