| 电位溶出速率常数物理意义的探讨 |
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| 引用本文： | 阮湘元,王辉娜,赵鸿斌.电位溶出速率常数物理意义的探讨[J].东莞理工学院学报,1994(1). |
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| 作者姓名： | 阮湘元 王辉娜 赵鸿斌 |
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| 作者单位： | 东莞理工学院应用化学系
(阮湘元)，株洲电视大学
(王辉娜)，湘潭大学(赵鸿斌) |
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| 摘 要： | 本文从理论和实验上证明,汞膜和金膜电极的电位溶出过程的速率,由溶液中的氧化剂在电极表面的极限流量所决定,与氧化剂本身的氧化—还原过程中的电子转移数无关,从而获得了完全的常规电位溶出的过渡时间方程式。
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| 关 键 词： | 电位溶出 速率常数 电极表面 氧化剂 |
AN EXPLORATION ON PHYSICAL SIGNIFICANCE OF THE RATE CONSTANT OF POTENTIAL STRIPPING PROCESS |
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| Ruan Xiangyuan.AN EXPLORATION ON PHYSICAL SIGNIFICANCE OF THE RATE CONSTANT OF POTENTIAL STRIPPING PROCESS[J].Journal of Dongguan Institute of Technology,1994(1). |
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| Authors: | Ruan Xiangyuan |
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| Institution: | Ruan Xiangyuan
(Department of applied Chemistry)
Wang Huina
(TV University of Zhuzhou City)
Zhao Hongbin
(Xiang Tan University) |
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| Abstract: | In this paper, authors prove both theoretically and experimentally that the rate of the potential stripping process of mercury film and gold film electrode is determined by the limit flow of the oxidant in the solution on the electrode surface, and it has nothing to do with the electronic shifting numbers in the process of the oxidation - reduction of the oxidant. Thereby, the transient time formula of the potential stripping of entire convention is obtained. |
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| Keywords: | Potential stripping Rate constant Electrode surface Oxidant |
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