首页 | 本学科首页   官方微博 | 高级检索  
     


Edge termination study and fabrication of a 4H-SiC junction barrier Schottky diode
Affiliation:Chen Feng-Ping,Zhang Yu-Ming,Zhang Yi-Men,Tang XiaoYan,Wang Yue-Hu,Chen Wen-Ha(a) School of Microelectronics, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices Xidian University, Xi'an 710071, China ; b) School of Technical Physics, Xidian University, Xi'an 710071, China)
Abstract:
Keywords:4H-SiC  junction barrier Schottky  offset field plate  electrical characteristics
本文献已被 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号