Output characteristics and parameters of the plasma from a gas-discharge low-pressure ultraviolet source using helium-iodine and xenon-iodine mixtures |
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Authors: | A K Shuaibov I A Grabovaya Z T Gomoki A G Kalyuzhnaya and A I Shchedrin |
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Institution: | (1) Institute of Solid State Electronics, Ilmenau Technical University, PF 100565, D-98684 Ilmenau, Germany;(2) Leibniz Institute for Solid State and Materials Research IFW Dresden, PF 270116, D-01171 Dresden, Germany |
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Abstract: | The output characteristics and parameters of the plasma of a powerful gas-discharge source of UV radiation are studied. The
UV source uses He-I2 and Xe-I2 mixtures and is excited by a longitudinal glow discharge. The pressure of the gas mixtures is varied from 100 to 1500 Pa,
and the discharge power falls into the range 15–250 W. The source (lamp) emits in the spectral interval 200–390 nm, which
covers the spectral line of the iodine atom at 206.2 nm, the spectral band of XeI(B-X) with a maximum at 253 nm, and the spectral band of with a maximum at 342 nm. For He(Xe)-I2 mixtures at a pressure of 800–1000 Pa (this pressure range is near-optimal according to our experimental data), the electron
energy distribution functions and the electron kinetic coefficients as functions of parameter E/N (E is the electric field strength, and N is the particle concentration in the discharge) are calculated. The calculated plasma parameters are used in the qualitative
analysis of key electronic processes in the plasma of an exciplex halogen UV source and will be subsequently employed in numerical
simulation of the process kinetics and output characteristics of a UV source based on helium-iodine or xenon-iodine mixtures. |
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