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XPS研究等离子体处理的聚苯乙烯表面结构
引用本文:张瑞峰,于亚莉,刘学恕,姚耀广.XPS研究等离子体处理的聚苯乙烯表面结构[J].高分子学报,1991,0(3):293-300.
作者姓名:张瑞峰  于亚莉  刘学恕  姚耀广
作者单位:中国科学院长春应用化学研究所,中国科学院长春应用化学研究所,中国科学院广州化学研究所,中国科学院广州化学研究所 长春 130022,长春 130022,广州 510650,广州 510650
基金项目:国家自然科学基金资助的课题
摘    要:采用不同功率(10、20、60、100、150W)、时间(0.5、1、3、6、15和30分),在Ar、N_2、O_2、H_2和空气中,对聚苯乙烯(PS)片基进行了等离子体处理。 通过XPS技术、谱图的拟合、差谱分析和Ar~+小功率剖面处理,研究了PS表面组成与结构变化,指出处理的聚苯乙烯表面有C—O、C—NH_2、C=O、COOH和基团嵌入,因而改变了材料特性。

关 键 词:聚苯乙烯  等离子体处理XPS研究
收稿时间:1989-12-05

XPS STUDIES OF SURFACE STHUCTURE OF POLYSTYRENE EXPOSED TO THE PLASMA
ZHANG Rui-feng,YU Ya-li,LIU Xue-shu,YAO Yao-guang.XPS STUDIES OF SURFACE STHUCTURE OF POLYSTYRENE EXPOSED TO THE PLASMA[J].Acta Polymerica Sinica,1991,0(3):293-300.
Authors:ZHANG Rui-feng  YU Ya-li  LIU Xue-shu  YAO Yao-guang
Institution:Changhua Institute of Applied Chemistry; Academic Sinica; Changchun 130022; Guangzhou Institute of Chemistry; Acadetnia Sinici; Guangzhou 510650
Abstract:The polystyrene (PS) substrates were treated by the plasma at different time (0.5, 1,3,6,15, 30 and 60 minutes) and power (10,20,60,100,150 W) in the Ar, N2, O2, H2 and air.The surface compositions, structure and states of the polystyrene are characterized by X-ray photoelectron spectroscopy (XPS)We have found that large amounts of O and N atoms as new structure are incorporated into the polymer surface by the plasma treatment.We have observed that functional groups, such as C-O, C-NH2 C=O, COOH and O- C - O were introduced to surface of polystyrene under these conditions. The depth profiling can be accomplished by controlled erosion of the surface Ar+ sputtering. The shake-up stallite peak (291.7 eV) for the polystyrene can again be present after Ar+ sputtering 60 A.
Keywords:Polystyrene  Plasma treatment  XPS study
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