Drying kinetics and segregation in a two-component anti-adherent coating studied by photoluminescence and Raman spectroscopies |
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Authors: | R Rodríguez S Jiménez-Sandoval S Vargas |
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Institution: | a Centro de Física Aplicada y Tecnología Avanzada, UNAM, Campus Juriquilla, A. Postal 1-1010, Querétaro, Qro. 76000, Mexico b Centro de Investigación y Estudios Avanzados, I.P.N., U. Querétaro, A. Postal 1-798, Qro. 76001, Mexico |
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Abstract: | It is presented a study on the drying kinetics and segregation of a two-component solvent-based polymeric coating containing a silicon-based additive as anti-adherent. For this purpose, micro-Raman spectroscopy was employed with a two fold goal: (i) to study the kinetics of the drying process through the characterization of the fluorescence emission as a function of drying time and, (ii) to analyze the phase segregation between the polymeric resin and the anti-adherent, by using confocal Raman spectroscopy to determine the chemical composition as a function of depth in dry films. The coatings were applied on silicon wafers. |
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Keywords: | 81 05 Lg 81 16 Be 81 90 +c |
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