On the use of single-photon ionization for inorganic surface analysis

Summary A general surface analysis method has been developed based on non-selective photoionization of sputtered or desorbed neutral atoms and molecules above the surface, followed by time-of-flight mass spectrometry. The approach, currently utilizes two main types of ionizing radiation and a variety of desorption probes. For photoionization, coherent untuned sources are used; an intense focused pulsed UV laser beam is used for non-resonant multiphoton ionization to give elemental and limited chemical information, usually used for inorganic analysis; a coherent VUV source is used for single-photon ionization at 118 nm (10.5 eV) produced by frequency tripling of 355 nm light from a Nd:YAG laser. This paper focuses on single-photon ionization for inorganic systems. The desorption probes used are ion, electron, and laser beams as well as thermal desorption. For depth profiling, ion beams are specifically used. Any focused desorption probe beam can provide lateral spatial resolution.