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Correlated percolation in a film-deposition model
Authors:Abdullah Sadiq  M. Ahsan Khan
Affiliation:(1) Pakistan Institute of Nuclear Science and Technology, P.O. Nilore, Rawalpindi, Pakistan
Abstract:Clustering phenomenon has been studied in a film-deposition model in which a monolayer of particles is deposited onto a substrate. The occupation of a given site is assumed to depend on the occupation states of its nearest neighbouring sites as well as on the temperature of the particles being deposited. It is found that the percolating clusters remain ramified in that the number of their boundary sites are proportional to the number of particles in the cluster. The percolation threshold, however is lowered to (54±2)% as compared to 59% density for the uncorrelated case.
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