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A novel method of preparing of glass capillary columns: Low-temperature plasma etching and polymerization
Authors:Y Masada  K Hashimoto  T Inoue  Y Sumida  T Kishi  Y Suwa
Abstract:A novel method is described for the preparation of stable glass capillary columns (glass open tubular columns), including the etching and formation of a polymer film on the inner glass capillary surfaces. The approach used here is based on low-temperature plasma etching and polymerization. Under the influence of a field of radio frequency discharge, low pressure gases of fluoric compounds, introduced into the glass capillary tube, generate excited fluorine radicals which etch the inner surface. The plasma of organosilicone monomer in the glass capillary yields a uniform polymerized film on the inner surface. The resultant material functions as a good stationary phase for glass capillary gas chromatography (GC2). The inner surfaces treated with such a plasma, can be studied by means of a scanning electron microscope (SEM). The flexibility of this method permits the use of various stationary phases and surface modification.
Keywords:Gas chromatography  Capillary  glass  Low temperature plasma etching  Polymer film on the inner surface from organosilicone monomer  Flexibility of this new method discussed  Discharge chamber described
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