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Investigation of the influence of low-concentration hydrogen on the surface potential of thin metallic films for sensor applications
Authors:Joanna Prażmowska  Adam Szyszka  Regina Paszkiewicz  Marek Tłaczała
Institution:(1) University of California at Davis, Davis, USA;(2) Department of System Engineering, Yeditepe University, Kayısdag, 81130 Istanbul, Turkey;(3) Mechanical Engineering Department, Faculty of Engineering and Architecture, Abant Izzet Baysal University, Golkoy Campus, 14280 Bolu, Turkey
Abstract:In this paper, a study of the influence of hydrogen (concentrations 6 ppm − 1%) on the work function of thin metallic films at moderately elevated temperatures is presented. The work function was measured indirectly by the observation of the surface potential of dedicated test structures using scanning surface potential microscope. Metallic layers with thicknesses of 10, 20, 30, and 50 nm were deposited on semiconductor substrates as well as on a thick gold layer. The investigations were focused on palladium thin films although a comparison to results obtained for platinum layers was also discussed.
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