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Magnetic properties of iron nitride films prepared by oblique sputtering under different nitrogen gas flow ratios (N2/N2+Ar)
Affiliation:1. Dipartimento di Fisica, Università di Ferrara, Via Saragat 1, 44122 Ferrara, Italy;2. CNISM, ,Unità di Ferrara, Via Saragat 1, 44122 Ferrara, Italy;3. Dpto. Física de Materiales, Facultad Ciencias Físicas. Universidad Complutense de Madrid, Ciudad Universitaria s/n, Madrid 28040, Spain;1. Department of Materials Science & Metallurgy, University of Cambridge, UK;2. Department of Engineering, University of Cambridge, UK
Abstract:Iron nitride thin films were prepared on Si (100) substrates by oblique radio-frequency reactive magnetron oblique sputtering. Structures, phases and magnetic properties were investigated as a function of nitrogen gas flow ratio FN(FN=FN2/(FN2+FAr)×100%). When FN is in the range of 2–7%, the iron nitride films show amorphous or nano-crystalline structures, which exhibit good soft magnetic properties. With 3%≤FN≤6%, films show in-plane uniaxial magnetic anisotropy. Both intrinsic damping factor αin and extrinsic damping factor αex of the iron nitride films increase with increasing FN. The film deposited under FN=6% with the resonance frequency fr=3.3 GHz and full width at half-maximum Δf=3.6 GHz has great potential for high-frequency electromagnetic shielding applications.
Keywords:Amorphous materials  Thin films  X-ray diffraction  Magnetic properties
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