直接带隙Ge$lt;sub$gt;1-$lt;em$gt;x$lt;/em$gt;$lt;/sub$gt;Sn$lt;sub$gt;$lt;em$gt;x$lt;/em$gt;$lt;/sub$gt;本征载流子浓度研究

通过合金化改性技术, Ge可由间接带隙半导体转变为直接带隙半导体. 改性后的Ge半导体可同时应用于光子器件和电子器件, 极具发展潜力. 基于直接带隙Ge_1-xSn_x半导体合金8带Kronig-Penny模型, 重点研究了其导带有效状态密度、价带有效状态密度及本征载流子浓度, 旨在为直接带隙改性Ge半导体物理的理解及相关器件的研究设计提供有价值的参考. 研究结果表明: 直接带隙Ge_1-xSn_x合金导带有效状态密度随着Sn组分x的增加而明显减小, 价带有效状态密度几乎不随Sn组分变化. 与体Ge半导体相比, 直接带隙Ge_1-xSn_x合金导带有效状态密度、价带有效状态密度分别低两个和一个数量级; 直接带隙Ge_1-xSn_x合金本征载流子浓度随着Sn组分的增加而增加, 比体Ge半导体高一个数量级以上.关键词：1-xSn_x')" href="#">Ge_1-xSn_x直接带隙本征载流子浓度

Study on intrinsic carrier concentration of direct bandgap Ge1-xSnx

Indirect bandgap Ge can be turned to a direct bandgap semiconductor by the alloy-modified technique, which can be applied to advanced photonic devices and electronic devices. Based on 8 bands Kronig-Penny Hamilton, this paper focuses on the physical parameters of direct bandgap Ge_1-xSn_x, such as conduction band effective density of states, valence band effective density of states and the intrinsic carrier concentration, and aims to provide valuable references for understanding the direct bandgap modified Ge materials and device physics as well as their applications. Results show that: conduction band effective density of states in direct bandgap Ge_1-xSn_x alloy decreases obviously with increasing Sn fraction, while its valence band effective density of states almost does not change with increasing Sn fraction. Compared with bulk Ge, the conduction band effective density of states and valence band effective density of states in direct bandgap Ge_1-xSn_x alloy are lower by two and one orders of magnitude respectively; the intrinsic carrier concentration in direct bandgap Ge_1-xSn_x alloy increases with increasing Sn fraction, and its value is an order of magnitude higher than that of bulk Ge.
Keywords：1-xSn_x')" href="#">Ge_1-xSn_xdirect bandgapintrinsic carrier concentration