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单晶金刚石边缘表面倾斜角度对同质外延生长的影响
引用本文:耿传文,夏禹豪,赵洪阳,付秋明,马志斌. 单晶金刚石边缘表面倾斜角度对同质外延生长的影响[J]. 物理学报, 2018, 67(24): 248101-248101. DOI: 10.7498/aps.67.20181537
作者姓名:耿传文  夏禹豪  赵洪阳  付秋明  马志斌
作者单位:武汉工程大学材料科学与工程学院, 湖北省等离子体化学与新材料重点实验室, 武汉 430073
基金项目:国家自然科学基金(批准号:15G006)和中国电子科技集团公司第四十六研究所创新基金(批准号:CJ20150701)资助的课题.
摘    要:利用微波等离子体化学气相沉积法,对单晶金刚石(100)晶面边缘进行精细切割抛光处理,形成偏离(100)晶面不同角度的倾斜面,在CH_4/H_2反应气体中进行同质外延生长,研究单晶金刚石边缘不同角度倾斜面对边缘金刚石外延生长的影响.实验结果表明,边缘倾斜面角度对边缘的单晶外延生长质量有影响,随着单晶金刚石边缘倾斜面角度的增大,边缘多晶金刚石数量先减少后增多,在倾斜角3.8°时边缘呈现完整的单晶外延生长特性.分析认为,边缘不同角度的倾斜面会改变周围电场强度和等离子体密度,导致到达衬底表面的含碳前驱物发生改变,倾斜面台阶表面的含碳前驱物浓度低于能形成层状台阶生长的临界浓度是减弱单晶金刚石生长过程中边缘效应的主要原因.

关 键 词:单晶金刚石  倾斜面  化学气相沉积  边缘台阶
收稿时间:2018-08-15

Effect of edge inclination of single crystal diamond on homoepitaxial growth
Geng Chuan-Wen,Xia Yu-Hao,Zhao Hong-Yang,Fu Qiu-Ming,Ma Zhi-Bin. Effect of edge inclination of single crystal diamond on homoepitaxial growth[J]. Acta Physica Sinica, 2018, 67(24): 248101-248101. DOI: 10.7498/aps.67.20181537
Authors:Geng Chuan-Wen  Xia Yu-Hao  Zhao Hong-Yang  Fu Qiu-Ming  Ma Zhi-Bin
Affiliation:Provincial Key Laboratory of Plasma Chemistry and Advanced Materials, School of Materials Science and Engineering, Wuhan Institute of Technology, Wuhan 430074, China
Abstract:Polycrystalline diamond is easy to appear at the edge of single crystal diamond grown by homogeneous epitaxial growth, which makes it difficult to enlarge the two-dimensional surface area of single crystal diamond. In this study, the microwave plasma chemical vapor deposition (MPCVD) is used, the edge of the single crystal diamond (100) crystal face is finely cut and polished to form an inclined surface which is different from the (100) crystal plane at different angles. After being pretreatment, homogeneous epitaxial growth is carried out in a double-substrate waveguide-type MPCVD device with CH4/H2 reaction gas. At the same time, the variation of plasma near the inclined plane of (100) crystal edge is analyzed by optical emission spectroscopy to study the effect of the tilting on the growth of the diamond edge. The experimental results show that the angle of the inclined surface of the edge has an effect on the quality of single crystal epitaxial growth of the edge. As the angle of the inclined surface of the single crystal diamond increases, the quantity of edge polycrystalline diamond first decreases and then increases. At an oblique angle of 3.8°, the edge exhibits complete single crystal epitaxial growth characteristics, which conduces to expand the surface area of single crystal diamond. According to the analysis, the inclined surface at different angle changes the surrounding electric field strength and plasma density of the edge, resulting in the change of carbon-containing precursors reaching the surface of the substrate. When the concentration of carbon-containing precursors on the inclined step surface is higher than the growth threshold of layered step, excessive carbon-containing precursors will constantly collide with each other and accumulate to form polycrystalline diamond on the step. When the concentration is lower than the growth threshold of layered step, the carbon-containing precursors on the surface of the substrate will be laid out to form a layered step. Therefore, the edge effect during the growth of single crystal diamond is weakened at the tilt angle of 3.8°, which leads the concentration of carbon-containing precursors on the inclined step surface to be lower than the growth threshold of layered step.
Keywords:single crystal diamond  inclined surface  chemical vapor deposition  edge steps
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