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NiFe/Pt薄膜中角度相关的逆自旋霍尔效应
引用本文:韩方彬,张文旭,彭斌,张万里.NiFe/Pt薄膜中角度相关的逆自旋霍尔效应[J].物理学报,2015,64(24):247202-247202.
作者姓名:韩方彬  张文旭  彭斌  张万里
作者单位:电子科技大学, 电子薄膜与集成器件国家重点实验室, 成都 610054
基金项目:国家自然科学基金(批准号: 61471095)资助的课题.
摘    要:NiFe/Pt双层薄膜样品在铁磁共振时, NiFe磁矩进动所产生的自旋流注入到Pt层中, 由于逆自旋霍尔效应产生直流电压VISHE, 此电压会叠加到NiFe薄膜由于自旋整流效应而产生的电压VSRE 上, 实验测量所得电压为VISHEVSRE的叠加. 为了区分这两种不同机理对电压的贡献, 本文采取旋转外加静磁场的方法, 通过分析所测电压随磁场角度的变化从而分离出VISHE 的大小. 研究结果表明, 相比于单层NiFe(20 nm)薄膜样品, NiFe(20 nm)/Pt(10 nm)双层膜样品中由于NiFe自旋注入到Pt 中导致铁磁共振线宽增加. 与逆自旋霍尔效应产生的电压相比, 自旋整流效应的贡献较小, 但不可忽略. 本文工作有助于认清铁磁/非磁性金属材料中的自旋相关效应, 并提供了一种准确的分析逆自旋霍尔效应的方法.

关 键 词:铁磁共振  自旋整流效应  自旋抽运  逆自旋霍尔效应
收稿时间:2015-07-31

Angle dependent inverse spin Hall effect in NiFe/Pt thin film
Han Fang-Bin,Zhang Wen-Xu,Peng Bin,Zhang Wan-Li.Angle dependent inverse spin Hall effect in NiFe/Pt thin film[J].Acta Physica Sinica,2015,64(24):247202-247202.
Authors:Han Fang-Bin  Zhang Wen-Xu  Peng Bin  Zhang Wan-Li
Institution:State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China
Abstract:In NiFe/Pt bilayer, when spin current originating from the magnetization procession of NiFe is inject into the adjacent Pt layer under ferromagnetic resonance (FMR), the direct current (DC) voltage VISHE generated by inverse spin Hall effect (ISHE) will be added to the voltage VSRE generated by spin rectification effect (SRE), therefore the measured voltage in experiment is the sum of VISHE and VSRE. It is crucial to separate these contributions, which has been often overlooked before, in order to make a reasonable comparison of the ISHE among different materials. The voltages having symmetric (Lorentz type) and anti-symmetric (dispersive type) components both vary with the static magnetic field strength. However, they have different static magnetic field angle dependences according to our theoretical analysis. In order to distinguish the contribution of ISHE from that of SRE, in this paper, we employ a method, in which the voltage across the sample is measured when the static magnetic field is applied to different directions, to analyze the voltage by varying magnetic field angle in a range from 0° to 360° in steps of 10°, thereby separating the VISHE. The separation is carried out by fitting the angle dependent symmetric and anti-symmetric curves to different theoretical formulas of ISHE and SRE. The voltages of the two different contributions together with the phase angle of the microwave are obtained. At the same time, the FMR line width and the resonant field can be read out. The results show that the ferromagnetic resonance line width in NiFe(20 nm)/Pt(10 nm) sample is larger than that in NiFe(20 nm) sample due to the injection of spin current from NiFe to Pt in the bi-layer sample. We notice that in the curves of voltage vs. static magnetic field, the Lorentz symmetry components of the voltage from the bi-layer sample weight more than those from the single-layer sample. This is explained as a result of the existence of the ISHE in the bi-layer sample, where the spins are pumped from the magnetic layer to the adjacent nonmagnetic layer. The spin pumping effect does not show up in the single-layer sample. There are a large portion of symmetric components in the double layer sample, which is attributed to the ISHE. Although the voltage caused by the SRE is smaller than that by the ISHE, the SRE voltage cannot be ignored. Our work is crucial to understanding the spin-related effects in ferromagnetic/nonmagnetic metal material and provides an improved analysis method to study the spin pumping and the ISHE.
Keywords:ferromagnetic resonance  spin rectification effect  spin pumping  inverse spin Hall effect
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