| 光学特异材料的设计 |
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| 引用本文： | Christian Helgert,Thomas Pertsch,Carsten Rockstuhl,Ekaterina PshenaySeverin,Christoph Menzel,ErnstBernhard Kleyet.al.光学特异材料的设计[J].中国光学,2010,3(1):1-10. |
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| 作者姓名： | Christian Helgert Thomas Pertsch Carsten Rockstuhl Ekaterina PshenaySeverin Christoph Menzel ErnstBernhard Kleyet.al |
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| 作者单位： | Christian Helgert,Thomas Pertsch,Ekaterina Pshenay-Severin,Ernst-Bernhard Kley,Arkadi Chipouline(ZIK "ultra-optics" ,Institute of Applied Physics ,Friedrich Schiller University Jena, Max- Wien-Platz 1, 07743 Jena, Germany);Carsten Rockstuhl,Christoph Menzel,Christoph Etrich,Falk Lederer(Institute of Condensed Matter Theory and Solid State Optics, Friedrich Schiller University Jena, Max-Wien-Platz 1,07743 Jena, Germany);Uwe Huebner(Institute of Photonic Technology ,Albert-Einstein-Str. 9, 07745 Jena, Germany);Andreas Tuennermann(Fraunhofer Institute of Applied Optics and Precision Engineering, Albert-Einstein-Str. 7,07745 Jena, Germany) |
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| 摘 要： | In this contribution we review our latest achievements of combined experimental and theoretical studies to tailor the properties of optical metamaterials（MMs） at will. We give three examples of metamaterial designs that have been realized by means of electron-beam lithography and whose spectroscopic characteristics have been comprehensively investigated. In every case, our experiments are complemented by rigorous numer ical simulations. Particular emphasis is put on the significance of such tailored effective properties of optical MMs
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| 关 键 词： | 光学材料 材料性能 物理性能 光谱特征 |
| 收稿时间： | 2009-10-21 |
| 修稿时间： | 2009-12-24 |
Tailoring the properties of optical metamaterials |
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| Christian Helgert,Thomas Pertsch,Carsten Rockstuhl,Ekaterina Pshenay-Severin,Christoph Menzel,Ernst-Bernhard Kley,Arkadi Chipouline,Christoph Etrich,Uwe Huebner,Andreas Tuennermann,Falk Lederer.Tailoring the properties of optical metamaterials[J].Chinese Optics,2010,3(1):1-10. |
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| Authors: | Christian Helgert Thomas Pertsch Carsten Rockstuhl Ekaterina Pshenay-Severin Christoph Menzel Ernst-Bernhard Kley Arkadi Chipouline Christoph Etrich Uwe Huebner Andreas Tuennermann Falk Lederer |
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| Institution: | 1.ZIK “ultra-optics”,Institute of Applied Physics,Friedrich Schiller University Jena,
Max Wien Platz 1, 07743 Jena,Germany; 2.Institute of Condensed Matter Theory and Solid State Optics,Friedrich Schiller University Jena,
Max Wien Platz 1, 07743 Jena,Germany; 3.Institute of Photonic Technology,Albert Einstein Str. 9, 07745 Jena,Germany; 4.Fraunhofer Institute of Applied Optics and Precision Engineering, Albert Einstein Str. 7,07745 Jena,Germany |
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| Abstract: | In this contribution we review our latest achievements of combined experimental and theoretical studies to tailor the properties of optical metamaterials(MMs) at will. We give three examples of metamaterial designs that have been realized by means of electron beam lithography and whose spectroscopic characteristics have been comprehensively investigated. In every case, our experiments are complemented by rigorous numerical simulations. Particular emphasis is put on the significance of such tailored effective properties of optical MMs. |
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| Keywords: | optical metamaterials lithography negative-index |
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