微波等离子体化学气相沉积制备SiCN结晶膜及SiCN微米棒阵列

本文采用微波等离子体化学气相沉积(MPCVD)系统,以CH4, H2, N2作为源气体,以Si棒作为Si源,在Si衬底上制备出了SiCN结晶及SiCN微米棒阵列.样品的形貌由场发射扫描电子显微镜(SEM)表征分析.用X射线光电子谱(XPS)、Raman散射谱及X射线衍射(XRD)对样品的键合状态及结构进行表征,结果表明,所得到的SiCN薄膜是一具有新的六方结构的三元化合物.

Formation of Silicon Carbon Nitride Crystals and Aligned Silicon Carbon Nitride Microrods by Microwave Plasma Chemical Vapor Deposition

Silicon carbon nitride (SiCN) crystals and silicon carbon nitride aligned microrods were synthesized on Si wafer by the novel microwave plasma chemical vapor deposition (MPCVD) system with CH_4, H_2, N_2 and additional Si column as sources. The morphologies of the films were investigated by field emission scanning electron microscopy (SEM). The chemical bonding states of the SiCN crystals and the SiCN microrods were characterized by X-ray photoelectron spectroscopies (XPS) and Raman backscattering microscopies, suggesting that the films are multibonding structures. The X-ray diffraction spectra (XRD) revealed the SiCN crystals and microrods might possess a new hexagonal phase.