两种耐高温紫外正型光刻胶成膜树脂的制备及性能

分别通过N-(p-羟基苯基)甲基丙烯酰胺与N-苯基马来酰亚胺、N-苯基甲基丙烯酰胺与N-(p-羟基苯基)马来酰亚胺的共聚合,制备了两种聚合物树脂聚N-(p-羟基苯基)甲基丙烯酰胺共N-苯基马来酰亚胺(poly(HPMA-co-PMI))和聚N-苯基甲基丙烯酰胺共N-(p-羟基苯基)马来酰亚胺(poly(MPA-co-HPMI)).结果表明,这两种聚合物都是按1∶1的摩尔比交替共聚的,它们都具有良好的溶解性、成膜性和亲水性,并且它们的玻璃化温度Tg都在280℃以上.将它们分别与感光剂2,1,5-磺酰氯的衍生物、助剂二苯甲酮等复配成两种紫外正型光刻胶,初步光刻实验表明,其最大分辨率都可以达到1μm,并且都可以耐270℃的高温.

Preparation and Properties of Two High-Thermostability Matrix Resins for UV Positive Photoresist

Two copolymers poly((N-(p-hydroxyphenyl)methacrylamide)-co-(N-phenylmaleimide)) poly(HPMI-co-PMA) and poly((N-phenylmethacrylamide)-co-(N-(p-hydroxyphenyl)maleimide)) poly(PMA-co-HPMI) were prepared from the copolymerizations of N-(p-hydroxyphenyl)methacrylamide and N-phenylmaleimide,and N-phenylmethacrylamide and N-(p-hydroxyphenyl)maleimide,respectively.It showed that both copolymers were 1∶1 in molar composition and were alternating.Both had good solubility in organic solvent,film-forming characteristics,hydrophilicity,and high glass transition temperature(Tg>280℃).As matrix resins,they were mixed respectively with photosensitizer derivative of 2,1,5-diazonaphthoquinone sulfochloride(DNS),additive benzophenone,etc.to obtain two UV positive photoresist.Preliminary photolithographic experiments testified that both photoresists had a resolution of no less than 1 μm and a high-thermostability of up to 270℃.