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Research on the UV Dielectric Coatings with High Damage Threshold
作者单位:China Institute of Atomic Energy,P.O.Box 2757,Beijing 102413,China
基金项目:Supported by the Nuclear Industry Science and Technology Foundation.
摘    要:ResearchontheUVDielectricCoatingswithHighDamageThresholdGAOHuailinSHANYushengWANGNaiyan(ChinaInstituteofAtomicEnergy,P.O.Box...

收稿时间:1996/10/21

Research on the UV Dielectric Coatings with High Damage Threshold
Abstract:The designs, performances and the damage thresholds of HfO2/SiO2 high-reflector and Al2O3/MgF2 antireflection coating are reported. Experimental results show that the damage thresholds of HR are 1.71 J/cm2 on the fused silica substrate and 1.65 J/cm2 on K9 optical glass substrate, respectively. By the heat processing under the condition of 400 ℃ for four hours, the damage threshold of HR with the additional coatings on the fused silica substrate decrease by 10% and increase by 10% on the K9 optical glass substate, respectively. Under the same condition, the change of the damage threshold of AR coatings with those two additional is 10% higher by heat treatment than that without heat treatment. The value of the damage threshold of AR coatings with overcoating and undercoating is 10% higher than that with underconating only. The damage threshold of AR coating is 1.74 J/cm2 on the fused silica substrate.
Keywords:KrF laser  UV delectric coating  damage threshold
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