| 超细Ar/O2大气压等离子体射流选择性去除聚氯代对二甲苯薄膜 |
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| 引用本文： | 郭红磊,刘景全,陈翔,杨斌,杨春生.超细Ar/O2大气压等离子体射流选择性去除聚氯代对二甲苯薄膜[J].强激光与粒子束,2015,27(2):024114. |
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| 作者姓名： | 郭红磊 刘景全 陈翔 杨斌 杨春生 |
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| 作者单位： | 1.上海交通大学微/纳电子系, 上海 200240; |
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| 摘 要： | 介绍了一种在大气压环境下产生超细Ar/O2等离子体射流的装置。为了降低等离子体射流的尺寸，一种特制的玻璃微针被用于制作等离子体射流源。当施加在电极上的电压为4.0 kV时，该装置能产生基本均匀和稳定等离子体射流，且等离子体射流的线宽仅有几m。此外，探究了该超细等离子体射流选择性去除聚氯代对二甲苯薄膜的可能性。实验结果表明，该超细Ar/O2等离子体射流能有效地选择性去除聚氯代对二甲苯薄膜，去除速率可达2.4 m/min。因此，这种超细Ar/O2大气压等离子体射流有可能用于材料的超细加工。
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| 关 键 词： | 大气压等离子体射流 微针 聚合物薄膜 选择性去除 |
| 收稿时间： | 2014-09-18 |
Selective removal of parylene-C film by ultrafine Ar/O2 atmospheric pressure plasma jet |
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| Institution: | 1.Department of Micro/Nano Electronics,Shanghai Jiaotong University,Shanghai 200240,China;2.National Key Laboratory of Science and Technology on Micro/Nano Fabrication Laboratory,Shanghai 200240,China;3.Key Laboratory for Thin Film and Micro Fabrication of Ministry of Education,Shanghai 200240,China |
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| Abstract: | A special microneedle is employed to prepare an ultrafine Ar/O2 atmospheric pressure plasma jet source device. When a high voltage of 4.0 kV is applied to the electrodes, this device can generate stable and almost homogeneous plasma jet, and its line width is on the order of tens of micrometers.Additionally, the ability of ultrafine Ar/O2 plasma jet to selectively remove parylene-C film is also investigated. Experimental results indicate that this ultrafine Ar/O2 plasma jet can effectively remove parylene-C film and the removal rate reaches 2.4 m/min. Therefore, this Ar/O2 atmospheric pressure plasma jet have the potential of being used to the ultrafine process for future material processing. |
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