周期性和孤立的纳米结构的超透镜亚波长成像

超透镜光刻技术是一种很有前景的纳米结构成像技术，由于其具有可以克服衍射极限的能力，直到2005年，张翔和他的同事在365 nm紫外线波长下成功的对一排纳米线和刻在高分子膜上的四个字母NANO实现了超分辨成像，分辨率高达1/6入射波长。通过传递矩阵方法优化出超透镜结构，并通过选择适当的材料和设计在超透镜结构中的每个层的厚度以及合理的优化实验等方法制备一个新的超透镜结构，利用这种超透镜结构实现了周期性纳米结构及孤立纳米结构的亚波长成像。实验结果表明，对于周期性的纳米结构，其图像分辨率达到100 nm，而孤立结构的分辨率低于50 nm，小于入射波长的1/7。

Subwavelength imaging of periodic and isolated nanostructures through silver superlens

The superlens nanolithography is a promising technique for patterning nanoscale structures because of its ability to overcome the diffraction limit. Until 2005, Zhang and his co-works successfully obtained images such as line grating and NANOalphabet through a thin silver film with a UV light at 365 nm wavelength and the resolution is down to 1/6 of the incidence wavelength. In this paper, subwavelength imaging of periodic and isolated nanostructures through a new silver superlens is investigated by appropriately choosing the material and designing the thickness of each layer in the lens structure as well as controlling the experimental procedure. The superlens structure was optimized by means of the transfer transmission matrix method. Subwavelenght imaging of periodic and isolated nanostructures was performed through this superlens structure. The experiments show that for periodic nanostructures the imaging resolution is about 100 nm, while for isolated nanostructues the resolution is below 50 nm, less than 1/7 of the incidence wavelength.