Al—Ge共蒸膜晶化现象的TEM研究 |
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引用本文: | 王戴木. Al—Ge共蒸膜晶化现象的TEM研究[J]. 阜阳师范学院学报(自然科学版), 1997, 0(4): 5-8 |
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作者姓名: | 王戴木 |
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作者单位: | 阜阳师范学院物理系 |
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摘 要: | 本文对三种不同Al原子百分比的Al—Ge共蒸膜进行了透射电镜观察研究,实验表明:a—Ge的晶化行为敏感地依赖于共蒸膜中Al原子百分比及退火温度,分形结构的出现是由于温度场控制的随机逐次成核机制作用的结果。
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关 键 词: | 薄膜 铝/锗共蒸膜 晶化 TEM 铝/锗双层膜 |
TEM Investigation of Crystallization Behavior in Al - Ge thin Films |
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Abstract: | Evaporated Al -Ge thin films with various Al -atom ratio were investigated by TEM. Experiments show that the crystallization behavior of a -Ge is sensitively dependent on the Al -atom ratios and on the annealing temperatures. The random successive nucleation mechanism can be used to enplain the behavior of the fractal formation. |
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