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An X-ray photoelectron spectroscopy study of volatile tin compounds
Authors:Steven C. Avanzino  William L. Jolly
Affiliation:The Department of Chemistry, University of California, and the Inorganic Materials Research Division, Lawrence Berkeley Laboratory, Berkeley, California 94720 U.S.A.
Abstract:Core-level X-ray photoelectron spectra of fifteen compounds of tin have been measured in the gas phase. The compounds include various organo and halo compounds as well as tin(IV) nitrate and Sn{N[Si(CH3)3]2}2. The tin binding energies span a range of 4.4 eV and are well correlated by the “transition-state” point-charge potential model equation using atomic charges calculated by the CHELEQ electro-negativity equalization method. As expected, the empirically determined parameter k for tin is smaller than the k values obtained in previous work for carbon, silicon, and germanium. For Sn(NO3)4, and Sn{N[Si(CH3)3]2}2, the bonding can be described as a weighted average of several resonance structures. In these cases the binding energy data were used in conjunction with the CHELEQ method to determine the resonance structure weightings.
Keywords:For correspondence.
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